A second SEM, a JEOL JSM-840A, is equipped with a LaB6 filament and a PGT EDXS system for high-resolution imaging (4 nm) and microanalysis of elements down to Be. This instrument has SEI and BEI, as well as HKL Technology electron backscattered pattern (EBSP) hardware and software for orientational imaging and mapping of specimens. It also has a NPGS electron-beam lithography system. The microscope has extensive automation, image storage and processing capabilities.
