NanoScale Materials Characterization Facility

 

JEOL 6700F Scanning Electron Microscope

ROOM: MSE 116

SPECS:
Cold field-emission gun SEM
Operating range: 0.5 to 30 kV in 0.1 kV steps
Resolution: 1.0 nm at 15 kV and 2.2 nm at 1.0 kV
Secondary electron imaging (SEI) capability utilizing both through-the-lens and in-chamber secondary electron detectors
Backscattered electron imaging (BEI) with both compositional and topographical imaging contrast
Cathodoluminescence system: able to scan and image and allows spectroscopy of light emitted from the specimen
Light element detection: equipped with a PGT IMIX-SPIRIT energy-dispersive X-ray spectroscopy (EDXS) detector with an ultra-thin window for light element detection down to boron
In situ capabilties: equipped with liquid-nitrogen cooling stage and a heating stage

 

 

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JEOL 840 Scanning Electron Microscope

ROOM: MSE 115

SPECS:
LaB6 filament SEM
Operates range: from 0.5 to 30 kV in 0.1 kV steps
Resolution: down to 4nm
PGT EDXS system fro high resolution imaging
Secondary electron imaging (SEI)
Backscattered electron imaging (BEI)
EBSP: HKL Technology electron backscattered pattern hardware and software for orientation imaging and mapping of specimens
NPGS electron-beam lithography system
Extensive automation, image storage and processing capabilities