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Jiwei Lu

Jiwei Lu

Research Associate Professor

Ph.D. Materials Science; University of California, Santa Barbara, 2005
M.E. Materials Science and Engineering; Tsinghua University, Beijing, China, 2001
B.E. Materials Science and Engineering; Tsinghua University, 1999

Department of Materials Science & Engineering
University of Virginia
PO Box 400745
395 McCormick Road
Charlottesville, VA 22904-4745
Office: Wilsdorf Hall Room 220
p: 434-243-2172
f: 434-982-5799

Website: Nanostar

Research Interests

Dr. Lu has a very strong interest in the metal-insulator transition of vanadium dioxide (VO2). VO2 is a paradigm of strongly correlated oxides and shows many intriguing properties that are still not understood and remain great intellectual challenges. Learning the fundamental rules behind these correlations will pave the way toward designing and fabricating new generations of materials whose behaviors are predictable and perhaps even useful. Another focus of his research is on multiferroic thin films which are of great interest for next generation Spintronics. Multiferroic materials have the combination of magnetic, electric dipole, and/or strain ordering. The coupling between magnetization and electric polarization in the multiferroics could lead to new flexible functionalities for future logic and memory devices.

Professonal Experience and Memberships

RESEARCH ASSOCIATE, University of Virginia, Charlottesville, VA 2006- 2008

Honors and Awards

Edward C. Henry Award (best paper award), the American Ceramic Society, 2006

Selected Publications

J.W. Lu, K. G. West and S. A. Wolf, Very large anisotropy in the dc conductivity of epitaxial VO2 thin films grown on (011) rutile TiO2 substrates, Applied Physics Letters 93, 262107 (2008)

K. G. West, J.W. Lu, L. He, D. M.  Kirkwood, W. Chen, T. P. Adl, M. S. Osofsky, S. B. Qadri, R. Hull and S. A. Wolf, Ferromagnetism in Rutile Structure Cr Doped VO2 Thin Films Prepared by Reactive-Bias Target Ion Beam Deposition, Journal of Superconductivity and Novel Magnetism (online first), (2008)

K. G. West, J.W. Lu, J. Yu, D.M. Kirkwood, W. Chen, Y. Pei, J. Claassen, and S.A. Wolf, Growth and characterization of vanadium dioxide thin films prepared by reactive-biased target ion beam deposition. Journal of Vacuum Science & Technology A, 26(1): p. 133-139 (2008).

J. W. Lu, S. Schmidt, D. S. Boesch, N. Pervez, R. A. York, S. Stemmer, Low-loss tunable capacitors fabricated directly on gold bottom electrodes, Applied Physics Letters 88, 112905 (2006)

J. W. Lu, S. Schmidt, Y.-W. Ok, S. P. Keane, S. Stemmer, Contributions to the dielectric losses of textured SrTiO3 thin films with Pt electrodes, Journal of Applied Physics 98, 054101 (2005)

S. Schmidt, J. W. Lu, S. P. Keane, L. D. Bregante, D. O. Klenov, and S. Stemmer, Microstructure and dielectric properties of textured SrTiO3 thin films Journal of American Ceramic Society 88, 789-801 (2005) (Invited Feature Article)

J. W. Lu, D. O. Klenov, S. Stemmer, Influence of strain on the dielectric relaxation of pyrochlore bismuth zinc niobate thin films, Applied Physics Letters 84, 957-959 (2004)

J. W. Lu, S. Stemmer, Low-loss, tunable bismuth zinc niobate films deposited by rf magnetron sputtering, Applied Physics Letters 83, 2411-2413 (2003).